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The Necessity of Precise Removal of Ultrafine Particles

A 1% Improvement in Yield Can Save Between $2 Million to $30 Million USD

In semiconductor chip manufacturing, cleaning processes run through the entire wafer processing flow, accounting for over 30% of steps. Technical difficulty increases exponentially with process node shrinkage. In semiconductor wafer manufacturing, photovoltaic wafer processing, and chip packaging/testing, precise removal of nanoparticle contaminants has become the "industry cancer" constraining yield, manifesting in all stages: 

  • Etching Stage

    Which can lead to open circuits or short circuit issues.

  • Photolithography Stage

    Which can lead to pattern defects.

  • Packaging and Testing Stage

    Causes optical component flaws and defects

  • Photovoltaic Substrate Wafer

    Particles of several hundred nanometers cause major crystal defects

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Collaboration Directions
  • Foundry Manufacturers

    Professional chip foundry manufacturing services

  • IDM Manufacturers

    Vertically Integrated Design, Manufacturing, Packaging & Testing Processes

  • Channel Manufacturers

    Holding Premium Supplier Code for Enterprises

  • Fabless Clients

    Focused on Chip Design, with Foundries Handling Manufacturing

  • Fab Manufacturers

    Own wafer fabs, specialize in chip manufacturing

Technological Advantages

Precision Dry Removal Solutions for Ultrafine Particles

  • Key Particle Removal Material Technology

  • Ultrafine Particle Visual Quantification Inspection Technology

  • Intelligent Analysis Technology

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